zhou wei-jun, yuan yong-hua, gui yuan-zhen, et al. Thermal effect of T TiO2/SiO2/K9 film by 1.06 μm CW laser[J]. High Power Laser and Particle Beams, 2005, 17.
Citation:
zhou wei-jun, yuan yong-hua, gui yuan-zhen, et al. Thermal effect of T TiO2/SiO2/K9 film by 1.06 μm CW laser[J]. High Power Laser and Particle Beams, 2005, 17.
zhou wei-jun, yuan yong-hua, gui yuan-zhen, et al. Thermal effect of T TiO2/SiO2/K9 film by 1.06 μm CW laser[J]. High Power Laser and Particle Beams, 2005, 17.
Citation:
zhou wei-jun, yuan yong-hua, gui yuan-zhen, et al. Thermal effect of T TiO2/SiO2/K9 film by 1.06 μm CW laser[J]. High Power Laser and Particle Beams, 2005, 17.
1.06 μm CW-Nd:YAG laser with different intensity was used to irradiate TiO2/SiO2/K9 film component, and the temperature rise of the film surface with time was measured by thermal MP575. A program was used to calculate the temperature field of laser with different intensity. Comparing experimental data with numerical simulation result, temperature change of film component with laser intensity and time were gained. The highest temperature was on the surface of film and the lowest on the surface of substrate in the direction of thickness, and the highest in the central of laser facular, the lowest at the edge in the radial direction.
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