Preparation of ZrO2/ SiO2 multilayer f ilms via chemical methods

In this paper , colloid-based multilayer coatings consisting of alternating layers of high-and low-refractive index compo nents were deposited on K9 glass and silicon wafer substrates by Sol-Gel spin-coating method. SiO2 was used as the low-refractive index component and ZrO2 as the high-refractive index material. The colloidal suspension of ZrO2 was prepared by hydrothermal hydrolysis of ZrOCl2 . The solvent in colloidal suspension of SiO2 was replaced by methoxyethanol through distillation. A high-pressure mercury lamp was used to do the irradiation treatment . SEM , IR and UV-VIS spectrophotometer were used to characterize the structure and optical properties of the films. Ellipssometry was used to study the thickness and refractive index of the films. The films were irradiated by a Q