Volume 17 Issue 09
Sep.  2005
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sun qi, zhou bin, yang fan, et al. Aluminium target with deep amplitude modulation fabricated by chemical wet etching process[J]. High Power Laser and Particle Beams, 2005, 17.
Citation: sun qi, zhou bin, yang fan, et al. Aluminium target with deep amplitude modulation fabricated by chemical wet etching process[J]. High Power Laser and Particle Beams, 2005, 17.

Aluminium target with deep amplitude modulation fabricated by chemical wet etching process

  • Publish Date: 2005-09-15
  • The aluminium modulation target used to study the Rayleigh-Taylor instability in the resolved experiments of Inertial Confined Fusion (ICF) was fabricated. Based on semiconductor photolithography technology and chemical wet etching process, the stripe pattern of line width 25 μm on aluminium foil surface was obtained. The effects of the reaction conditions on the etching rate were studied. The pattern topography and the surface constituent were measured and analyzed. Aluminium modulation targets of about 32 μm thick were prepared and the etching depth reached up to 20 μm.
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      沈阳化工大学材料科学与工程学院 沈阳 110142

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