jin chun-shui, lin qiang, ma yue-ying, et al. Study of uniform soft X-ray multilayers deposition technology[J]. High Power Laser and Particle Beams, 2003, 15.
Citation:
jin chun-shui, lin qiang, ma yue-ying, et al. Study of uniform soft X-ray multilayers deposition technology[J]. High Power Laser and Particle Beams, 2003, 15.
jin chun-shui, lin qiang, ma yue-ying, et al. Study of uniform soft X-ray multilayers deposition technology[J]. High Power Laser and Particle Beams, 2003, 15.
Citation:
jin chun-shui, lin qiang, ma yue-ying, et al. Study of uniform soft X-ray multilayers deposition technology[J]. High Power Laser and Particle Beams, 2003, 15.
A uniform soft X-ray multiplayers deposition technology is introduced in this paper, in which the platter revolution speed is varied as a function of its position relative to the sputtering source. Using this method, the relative thickness variation of the Mo/Si multilayers with central wavelength of 13.5nm was reduced from 7% to 1% peak to valley over 150mm diameter region on flat Si substrates.
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