li en-de, duan hai-feng, yang ze-ping, et al. Method of calibrating CCD optics-electron characteristic[J]. High Power Laser and Particle Beams, 2006, 18.
Citation:
li en-de, duan hai-feng, yang ze-ping, et al. Method of calibrating CCD optics-electron characteristic[J]. High Power Laser and Particle Beams, 2006, 18.
li en-de, duan hai-feng, yang ze-ping, et al. Method of calibrating CCD optics-electron characteristic[J]. High Power Laser and Particle Beams, 2006, 18.
Citation:
li en-de, duan hai-feng, yang ze-ping, et al. Method of calibrating CCD optics-electron characteristic[J]. High Power Laser and Particle Beams, 2006, 18.
The CCD’s optics-electron characteristic is an important parameter when it is applied to measuring the energy distribution of laser’s far-field and near-field. A new method of calibrating the CCD’s optics-electron characteristic is introduced in this paper. The method uses the zeroth order energy-distribution caused by the pinhole diffraction as the CCD’s fiducial input energy. According to the CCD’s output data sampling the pinhole diffraction, the optics-electron characteristic curve is calculated through the least-square algorithm. The data process procedure, the validation experimental result and the analysis of its residual error are presented.
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