hou hai-hong, hong rui-jin, fan zheng-xiu, et al. Measurement of surface and volume scattering of glass substrates with high finish[J]. High Power Laser and Particle Beams, 2006, 18.
Citation:
hou hai-hong, hong rui-jin, fan zheng-xiu, et al. Measurement of surface and volume scattering of glass substrates with high finish[J]. High Power Laser and Particle Beams, 2006, 18.
hou hai-hong, hong rui-jin, fan zheng-xiu, et al. Measurement of surface and volume scattering of glass substrates with high finish[J]. High Power Laser and Particle Beams, 2006, 18.
Citation:
hou hai-hong, hong rui-jin, fan zheng-xiu, et al. Measurement of surface and volume scattering of glass substrates with high finish[J]. High Power Laser and Particle Beams, 2006, 18.
A new experimental method to measure the surface scattering and volume scattering of the K9 glass substrate by the total integrated scattering(TIS) was presented. Ag film with a few ten nanometers thickness was deposited by magnetron sputtering, which differentiated the surface and volume of the substrate. Root mean square roughness of the front and back surface of the K9 substrate was measured by TIS, according to which the total scattering and the surface scattering of the substrate were obtained and the volume scattering was calculated. The total scatterings of 3 samples were 6.06×10-4,5.84×10-4 and 6.48×10-4, respectively. Surface scatterings were in the range of 1.25×10-4~1.56×10-4. TIS and atomic force microscopy(AFM) were used to measure root mean square roughness of Ag films,