peng ren-jun, chen xian-zhong, wang yan-ping, et al. A binary computer generated hologram method for atom hologram lithography[J]. High Power Laser and Particle Beams, 2006, 18.
Citation:
peng ren-jun, chen xian-zhong, wang yan-ping, et al. A binary computer generated hologram method for atom hologram lithography[J]. High Power Laser and Particle Beams, 2006, 18.
peng ren-jun, chen xian-zhong, wang yan-ping, et al. A binary computer generated hologram method for atom hologram lithography[J]. High Power Laser and Particle Beams, 2006, 18.
Citation:
peng ren-jun, chen xian-zhong, wang yan-ping, et al. A binary computer generated hologram method for atom hologram lithography[J]. High Power Laser and Particle Beams, 2006, 18.
Optoelectronic Information Department,University of Electronic Science and Technology of China,Chengdu 610054,China;
2.
State Key Laboratory of Optical Technology on Microfabrication,Institute of Optics and Electrons,Chinese Academy of Sciences,P.O.Box 350,Chengdu 610209,China
Atom hologram lithography employs binary computer generated hologram to handle atoms for making microstructure. The conventional binary hologram is inconvenient because it often has more than one reconstructed images. A new method of amplitude-only encoding is investigated. A hologram is formed by adding together a series of elementary functions, and then it is encoded with Lohmann Ⅲ like encoding to obtain a binary computer generated hologram. A simulation result shows that the mask made with the new method could produce a unique microstructure according to the original pattern.
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