huang chao, yu li, ma lian-ying, et al. Control and measurement of XeF2 concentration in chamber of XeF(C-A) laser operating on repetition mode[J]. High Power Laser and Particle Beams, 2006, 18.
Citation:
huang chao, yu li, ma lian-ying, et al. Control and measurement of XeF2 concentration in chamber of XeF(C-A) laser operating on repetition mode[J]. High Power Laser and Particle Beams, 2006, 18.
huang chao, yu li, ma lian-ying, et al. Control and measurement of XeF2 concentration in chamber of XeF(C-A) laser operating on repetition mode[J]. High Power Laser and Particle Beams, 2006, 18.
Citation:
huang chao, yu li, ma lian-ying, et al. Control and measurement of XeF2 concentration in chamber of XeF(C-A) laser operating on repetition mode[J]. High Power Laser and Particle Beams, 2006, 18.
The principle of real time measurement XeF2 concentration by absorbed spectrum and XeF2 concentration control means in laser chamber are introduced. Relation of XeF2 concentration between laser chamber and measure cell is given. XeF2 concentration could be controlled by adjusting the temperature of the XeF2 generator and the flow velocity in the main and carrier gas-passages. XeF2 concentrations under different mixed gas flow are obtained.
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