yuan xin-qiang, fan you-yu, feng ji-tian, et al. Laser damage threshold of telluride transmitting infrared fluoroaluminate glass[J]. High Power Laser and Particle Beams, 2005, 17.
Citation:
yuan xin-qiang, fan you-yu, feng ji-tian, et al. Laser damage threshold of telluride transmitting infrared fluoroaluminate glass[J]. High Power Laser and Particle Beams, 2005, 17.
yuan xin-qiang, fan you-yu, feng ji-tian, et al. Laser damage threshold of telluride transmitting infrared fluoroaluminate glass[J]. High Power Laser and Particle Beams, 2005, 17.
Citation:
yuan xin-qiang, fan you-yu, feng ji-tian, et al. Laser damage threshold of telluride transmitting infrared fluoroaluminate glass[J]. High Power Laser and Particle Beams, 2005, 17.
After introducing the low-phonon energy oxide——TeO2 into the fluoroaluminate glass, a new oxyfluoride glass was obtained with better vitrification ability. Some physical properties were measured of the new glass with different TeO2 content(such as characteristic temperature, Abbe value, infrared light transmittance, damage threshold for DF laser ). The telluride fluoroaluminate with TeO2 content 15% had a maximum damage threshold up to 14.95 kW·cm-2. Analysis indicates that the main reason of the glass damage is thermal impact, which results from the absorbed laser energy for glass matrix and hydroxyl vibration. If the water content in the glass can be reduced, it will improve the property of the glass.