Preparation of ultra-thin freestanding polyimide films with sequential evaporation technique

qi tong-fei; wu yong-gang; wang yong; zhang li; lin xiao-yan; tian guo-xun; jiao hong-fei; chen ling-yan

Volume 17 Issue 10

Oct. 2005

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zhou bin, qiu heng-shan, liu xiao-lin, et al. Single-step fabrication of diffraction grating on TiO2 photosensitive gels film by direct UV irradiation[J]. High Power Laser and Particle Beams, 2004, 16.

Citation:

qi tong-fei, wu yong-gang, wang yong, et al. Preparation of ultra-thin freestanding polyimide films with sequential evaporation technique[J]. High Power Laser and Particle Beams, 2005, 17.

Citation:

qi tong-fei, wu yong-gang, wang yong, et al. Preparation of ultra-thin freestanding polyimide films with sequential evaporation technique[J]. High Power Laser and Particle Beams, 2005, 17.

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Preparation of ultra-thin freestanding polyimide films with sequential evaporation technique

1.
Pohl Institute of Solid State Physics,Institute of Precise Optical Engineering and Technology,Tongji University,Shanghai 200092,China

Publish Date: 2005-10-15

Abstract

Abstract

Ultra-thin freestanding polyimide(PI) films of 100 nm thickness were formed by sequential evaporation of 4,4'-diaminodiphenyl ether(ODA) and pyromellitic dianhydride(PMDA) precursor monomers followed by a thermal treatment of 150 ℃ 1 h and 350 ℃ 2 h. The chemical structures of the PI films were investigated using FTIR spectroscopy and the degree of imidization was calculated. Results show that the PI film has a fully imidization. The surface morphology of the films, compared with co-deposited PI films, was observed using AFM, the surface morphology of the PI films would be better by depositing ODA first.
- sequential deposition,
- monomer,
- polyimide,
- freestanding film,
- surface morphology

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