Thermal effect of TiO2/SiO2 film irradiated by pulse laser

zhou wei-jun; yuan yong-hua; gui yuan-zhen; liu hai-tao

Volume 19 Issue 01

Jan. 2007

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zhou wei-jun, yuan yong-hua, gui yuan-zhen, et al. Thermal effect of TiO2/SiO2 film irradiated by pulse laser[J]. High Power Laser and Particle Beams, 2007, 19.

Citation:

zhou wei-jun, yuan yong-hua, gui yuan-zhen, et al. Thermal effect of TiO2/SiO2 film irradiated by pulse laser[J]. High Power Laser and Particle Beams, 2007, 19.

zhou wei-jun, yuan yong-hua, gui yuan-zhen, et al. Thermal effect of TiO2/SiO2 film irradiated by pulse laser[J]. High Power Laser and Particle Beams, 2007, 19.

Citation:

zhou wei-jun, yuan yong-hua, gui yuan-zhen, et al. Thermal effect of TiO2/SiO2 film irradiated by pulse laser[J]. High Power Laser and Particle Beams, 2007, 19.

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Thermal effect of TiO2/SiO2 film irradiated by pulse laser

1.
Institute of Fluid Physics,CAEP,P.O.Box 919-109,Mianyang 621900,China

Publish Date: 2007-01-15

Abstract

Abstract

Using 1.06 μm single pulse laser to irradiate optical element model of photoelectricity system in different energy density, physical model of multilayer films is found and temperature field of facula center, radial direction and axes direction is calculated with ANSYS software. At the same time thermal stresses in radial direction, axes direction and round direction in different energy density are calculated. Change of temperature field and thermal stress are analysed.
- laser irradiating,
- film,
- temperature field,
- thermal stress

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