Interface roughness of Mo/Si soft X-ray multilayers

qin jun-ling; shao jian-da; yi kui; zhou hong-jun; huo tong-lin; fan zheng-xiu

Volume 19 Issue 05

May 2007

Turn off MathJax

Article Contents

Abstract

References

Article Navigation > High Power Laser and Particle Beams > 2007 > 19(05): 0-

qin jun-ling, shao jian-da, yi kui, et al. Interface roughness of Mo/Si soft X-ray multilayers[J]. High Power Laser and Particle Beams, 2007, 19.

Citation:

qin jun-ling, shao jian-da, yi kui, et al. Interface roughness of Mo/Si soft X-ray multilayers[J]. High Power Laser and Particle Beams, 2007, 19.

qin jun-ling, shao jian-da, yi kui, et al. Interface roughness of Mo/Si soft X-ray multilayers[J]. High Power Laser and Particle Beams, 2007, 19.

Citation:

qin jun-ling, shao jian-da, yi kui, et al. Interface roughness of Mo/Si soft X-ray multilayers[J]. High Power Laser and Particle Beams, 2007, 19.

PDF( 329 KB)

Interface roughness of Mo/Si soft X-ray multilayers

1.
Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,P.O.Box 800-211,Shanghai 201800,China;
2.
Graduate University of Chinese Academy of Sciences,Beijing 100039,China;
3.
National Synchrotron Radiation Laboratory,University of Science and Technology of China,P.O.Box 6022,Hefei 230029,China

Publish Date: 2007-05-15

Abstract

Abstract

A series of Mo/Si multilayers were prepared by magnetron sputtering, with top layers being Mo layer and Si layer respectively. Periodic length of Mo/Si multilayers were determined by small angle X-ray diffraction. As fresh surfaces of Mo/Si multilayers with different period number were approximatively equal to the interface of the same multilayer, interface roughness change law of multilayers as layer number increases was studied by atomic force microscope. Soft X-ray reflectivity of Mo/Si multilayers were measured in National Synchrotron Radiation Laboratory. As the number of layers increases, interface roughness and peak reflectivity of multilayers first increase and then reduce．
- mo/si multilayers,
- soft x-ray,
- interface roughness,
- reflectivity

FullText(HTML)

References(0)

References

Relative Articles

[1]	Yi Qiang, Huang Qiushi, Wang Xiangmei, Yang Yang, Zhang Zhong, Wang Zhanshan, Xu Rongkun, Peng Taiping, Zhou Hongjun, Huo Tonglin. Narrow-band Si/Mo/C multilayer mirrors working at 13 nm[J]. High Power Laser and Particle Beams, 2016, 28(12): 122002. doi: 10.11884/HPLPB201628.160440
[2]	Xu Dechao, Wang Haixia, Zhang Zhong, Zhu Jie, Lian Yuhong, Wang Zhanshan. Stress and thermal properties of Mo/B₄C multilayers in soft X-rays[J]. High Power Laser and Particle Beams, 2015, 27(06): 062001. doi: 10.11884/HPLPB201527.062001
[3]	Li Yukun, Chen Tao, Deng Bo, Yuan Zheng, Cao Zhurong. Energy spectral response of photocathode for soft X-ray streak camera[J]. High Power Laser and Particle Beams, 2014, 26(02): 022002. doi: 10.3788/HPLPB201426.022002
[4]	Jin Yunsheng, Tan Fuli, He Jia, Li Mu, Zhang Yongqiang, Zhang Hongping, Zhao Jianheng. Numerical inverse computation of reflectivity[J]. High Power Laser and Particle Beams, 2013, 25(03): 549-552. doi: 10.3788/HPLPB20132503.0549
[5]	Guo ZhiyinG, Yi RonGqinG, Du HuabinG, He Xiaoan, ZhenG Lei, Zhao YidonG. Investigation on reflectance of soft X-ray mirror used in ICF experiments[J]. High Power Laser and Particle Beams, 2012, 24(09): 2113-2116. doi: 10.3788/HPLPB20122409.2113
[6]	wang xin, mu baozhong, huang yi, zhai zirong, yi shengzhen, jiang li, zhu jingtao, wang zhanshan, liu hongjie, cao leifeng, gu yuqiu. Influence of multilayer films condenser on imaging uniformity of Schwarzschild microscope[J]. High Power Laser and Particle Beams, 2011, 23(05): 0- .
[7]	tu yuchun, song zhuqing, huang qiushi, zhu jingtao, xu jing, wang zhanshan, li yizhou, liu jiaqi, zhang li. Fabrication of laterally graded periodic Mo/Si multilayer using magnetron sputtering technology[J]. High Power Laser and Particle Beams, 2011, 23(09): 0- .
[8]	pan lei, wang xiaoqiang, zhang zhong, zhu jingtao, wang zhanshan, li yizhou, li hongjie, wang daorong, zhao juyan, lu wei. Fabrication of high uniformity Mo/Si multilayer with 120 mm diameter using magnetron sputtering[J]. High Power Laser and Particle Beams, 2010, 22(07): 0- .
[9]	zhang hui-jing, zhang zhong, zhu jing-tao, bai liang, chen rui, huang qiu-shi, liu li-qin, tan mo-yan, wang feng-li, wang zhan-shan, chen ling-yan. Design and fabrication of high reflectivity Mo/B4C multilayer mirrors[J]. High Power Laser and Particle Beams, 2008, 20(01): 0- .
[10]	hou li-fei, yi rong-qing, du hua-bing, liu shen-ye, zhu jing-tao, zhao yi-dong, cui ming-qi. Reflectivity calibration of soft X-ray multilayer mirror in Beijing Synchrotron Radiation Facility[J]. High Power Laser and Particle Beams, 2007, 19(12): 0- .
[11]	qin jun-ling, shao jian-da, yi kui. Mo/Si multilayers prepared with different sputtering power of Mo target[J]. High Power Laser and Particle Beams, 2007, 19(01): 0- .
[12]	zhang zhong, wang zhan-shan, wang hong-chang, wnag feng-li, wu wen-juan, zhang shu-min, qin shu-ji, chen ling-yan. Multilayer beam splitter used in a soft X-ray Mach-Zehnder interferometer at working wavelength of 13.9 nm[J]. High Power Laser and Particle Beams, 2006, 18(05): 0- .
[13]	yi heng-yu, peng yong, hu xiao-yang, wang yao-mei, wang wen-dong, zhou wen-chao, zheng wei-min, huang zu-xin, liao yuan. Precise measurement system for reflectivity scanning of large aperture components[J]. High Power Laser and Particle Beams, 2005, 17(11): 0- .
[14]	wang zhan-shan, zhang zhong, wang feng-li, wu wen-juan, wang hong-chang, qin shu-ji, chen ling-yan. Fabrication of the multilayer beam splitters with large area for soft Xray laser interferometer[J]. High Power Laser and Particle Beams, 2004, 16(09): 0- .
[15]	jin chun-shui, lin qiang, ma yue-ying, pei shu, cao jian-lin. Study of uniform soft X-ray multilayers deposition technology[J]. High Power Laser and Particle Beams, 2003, 15(05): 0- .
[16]	wang zhan-shan, wuyong-gang, tang wei-xing, qin shu-ji, zhou bin, chen ling-yan. Soft X-ray multilayers and filters[J]. High Power Laser and Particle Beams, 2002, 14(03): 0- .
[17]	zhang jun. Albedo of X-ray through the region of rarefaction wave[J]. High Power Laser and Particle Beams, 2001, 13(03): 0- .
[18]	wang wei, ni yuan-long, wan bing-gen, sun jin-ren, wu jiang, wang chen, sun yu-qin, zhou guan-lin, gu yuan, wang shi-ji. Single-shot measurement of soft X-ray Mo/Si multi-layer mirror reflectance[J]. High Power Laser and Particle Beams, 2001, 13(05): 0- .
[20]	ke changjun, zhang tieqiang, wang zhanshan, cao jianlin, chen xingdan, . NUMERICAL SIMULATION OF DISORDER SOFT XRAY MULTILAYER FOR A MAXIMUM INTEGRATED REFLECTIVITY[J]. High Power Laser and Particle Beams, 1999, 11(01): 0- .