qi shu-feng, liu shang-he, liu hong-bing, et al. Latent failure of 2SC3356 caused by electrostatic discharge[J]. High Power Laser and Particle Beams, 2007, 19.
Citation: qi shu-feng, liu shang-he, liu hong-bing, et al. Latent failure of 2SC3356 caused by electrostatic discharge[J]. High Power Laser and Particle Beams, 2007, 19.

Latent failure of 2SC3356 caused by electrostatic discharge

  • Publish Date: 2007-04-15
  • Latent failure study on the low-level human body model(HBM) electrostatic discharge(ESD) stresses on microelectric device was presented. The low-level ESD stresses were imposed on microwave low noise transistor 2SC3356 using the HBM from CB (collector-base) junctions and EB (emitter-base) junctions. It is shown that the CB junctions are more sensitive than the EB junctions, of the latent failure on 2SC3356 caused by low-level ESD and that high temperature (≥125 ℃) life tests bring about annealing effects and relief the latent defects caused by low-level ESD stresses.
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      沈阳化工大学材料科学与工程学院 沈阳 110142

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