zhao yong-peng, yang da-wei, wang qi, et al. Applications of high power pulse technology to gas lasers at short wavelength[J]. High Power Laser and Particle Beams, 2007, 19.
Citation:
zhao yong-peng, yang da-wei, wang qi, et al. Applications of high power pulse technology to gas lasers at short wavelength[J]. High Power Laser and Particle Beams, 2007, 19.
zhao yong-peng, yang da-wei, wang qi, et al. Applications of high power pulse technology to gas lasers at short wavelength[J]. High Power Laser and Particle Beams, 2007, 19.
Citation:
zhao yong-peng, yang da-wei, wang qi, et al. Applications of high power pulse technology to gas lasers at short wavelength[J]. High Power Laser and Particle Beams, 2007, 19.
The high power pulse technology, which is used in the ionic excimer, excimer and soft X-ray lasers, is introduced. The electrical parameters required by the three types of lasers are given respectively. In order to obtain soft X-ray laser, ten-stage Marx generator and Blumlein transmission line are used to build the capillary discharge device with maximum current of 40 kA and rise-time of 26.6 ns. The soft X-ray laser is observed with the device. The electron beam device with voltage of 600 kV and current of 20 kA is used to pump the ionic excimer and the resonator effects are obtained. The narrow voltage pulse of 29.2 ns is realized to excite S2 excimer.
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