Effects of pre-conditioning on 355 nm laser-induced damage growth of fused silica

xu shizhen; jiang xiaodong; zheng wanguo; yuan xiaodong; zu xiaotao

Volume 22 Issue 07

Jun. 2010

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xu shizhen, jiang xiaodong, zheng wanguo, et al. Effects of pre-conditioning on 355 nm laser-induced damage growth of fused silica[J]. High Power Laser and Particle Beams, 2010, 22.

Citation:

xu shizhen, jiang xiaodong, zheng wanguo, et al. Effects of pre-conditioning on 355 nm laser-induced damage growth of fused silica[J]. High Power Laser and Particle Beams, 2010, 22.

xu shizhen, jiang xiaodong, zheng wanguo, et al. Effects of pre-conditioning on 355 nm laser-induced damage growth of fused silica[J]. High Power Laser and Particle Beams, 2010, 22.

Citation:

xu shizhen, jiang xiaodong, zheng wanguo, et al. Effects of pre-conditioning on 355 nm laser-induced damage growth of fused silica[J]. High Power Laser and Particle Beams, 2010, 22.

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Effects of pre-conditioning on 355 nm laser-induced damage growth of fused silica

1.
Department of Applied Physics,University of Electronic Science and Technology of China,Chengdu 610054,China;
2.
Research Center of Laser Fusion,CAEP,P.O.Box 919-988-5,Mianyang 621900,China

Publish Date: 2010-06-30

Abstract

Abstract

Laser-induced damage threshold of fused silica under 355 nm laser were measured before and after chemical etching, UV laser conditioning, and the combined processing. The area of damage spots increased with successive pulses irradiation. The results showed that the laser-induced damage threshold of processed samples increased while the area growth rate decreased. Mitigation of damage sites on fused silica by localized CO2 laser treatment was also investigated. The laser-induced damage threshold of treated damage sites was as high as the fused silica substrate by R-on-1 tests. The damage growth of treated sites on fused silica was mitigated effectively.
- fused silica,
- nd:yag laser,
- co2 laser,
- chemical etching,
- laser conditioning

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