HfO2 optical films prepared by dual ion beam sputtering deposition

zhang wen-jie; peng yu-feng; wang jian-cheng; cheng zu-hai

Volume 19 Issue 09

Sep. 2007

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zhang wen-jie, peng yu-feng, wang jian-cheng, et al. HfO2 optical films prepared by dual ion beam sputtering deposition[J]. High Power Laser and Particle Beams, 2007, 19.

Citation:

zhang wen-jie, peng yu-feng, wang jian-cheng, et al. HfO2 optical films prepared by dual ion beam sputtering deposition[J]. High Power Laser and Particle Beams, 2007, 19.

zhang wen-jie, peng yu-feng, wang jian-cheng, et al. HfO2 optical films prepared by dual ion beam sputtering deposition[J]. High Power Laser and Particle Beams, 2007, 19.

Citation:

zhang wen-jie, peng yu-feng, wang jian-cheng, et al. HfO2 optical films prepared by dual ion beam sputtering deposition[J]. High Power Laser and Particle Beams, 2007, 19.

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HfO2 optical films prepared by dual ion beam sputtering deposition

1.
Department of Physics and Information Science,Yulin Normal College,Yulin 537000,China;
2.
College of Physics and Information Engineering,He’nan Normal University,Xinxiang 453007,China;
3.
Shenzhen Shenxinlong Industry Co Ltd,Shenzhen 518055,China;
4.
School of Optoelectronics Science and Engineering,Huazhong University of Science and Technology,Wuhan 430074,China

Publish Date: 2007-09-15

Abstract

Abstract

HfO2 films have been deposited by dual-ion beam sputtering technology with starting material Hf. Optical, residual stress, structural properties and laser-induced damage threshold of the HfO2 films have been studied. It is found that the HfO2 shows uniform structural properties, film compact and structure and higher laser-induced damage threshold. The relation between structural and damage threshold of HfO2 films has also been studied.
- dual ion beam sputtering deposition,
- hfo2 films,
- laser-induced damage threshold,
- residual stress