Volume 20 Issue 06
Jun.  2008
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yang yu-jie, zhang lei, xu yao, et al. Anti-reflective mesoporous SiO2 films with high laser-induced damage threshold[J]. High Power Laser and Particle Beams, 2008, 20.
Citation: yang yu-jie, zhang lei, xu yao, et al. Anti-reflective mesoporous SiO2 films with high laser-induced damage threshold[J]. High Power Laser and Particle Beams, 2008, 20.

Anti-reflective mesoporous SiO2 films with high laser-induced damage threshold

  • Publish Date: 2008-06-15
  • Mesoporous SiO2 film with 2D p6 mm structure was successfully coated on K9 glasses via the hydrolysis-condensation process and the so-called evaporation induced self-assembly process using P123 as a surfactant. The structure and optical properties of the film were characterized with FT-IR,XRD,N2 adsorption-desorption,AFM and UV-Vis. The laser-induced damage threshold of the film was tested with “R-on-1” model on Nd:YAG laser(9.2 ns, 1 064 nm). The as-prepared single-layer mesoporous SiO2 film was proved to have ordered 2D p6 mm structure, SBA-15 type and average roughness of 2.923 nm. The film showed high trassimittance of 99.6% at the wavelength of 1 064 nm. The laser-induced damage threshold was 21.6 J/cm2 when the laser pulse was 1 ns, at wavelength of 1 064 nm.
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