zhang chun-lai, zu xiao-tao, jiang xiao-dong, et al. SiO2 sol-gel films after ammonia and heat two-step treatments[J]. High Power Laser and Particle Beams, 2008, 20.
Citation:
zhang chun-lai, zu xiao-tao, jiang xiao-dong, et al. SiO2 sol-gel films after ammonia and heat two-step treatments[J]. High Power Laser and Particle Beams, 2008, 20.
zhang chun-lai, zu xiao-tao, jiang xiao-dong, et al. SiO2 sol-gel films after ammonia and heat two-step treatments[J]. High Power Laser and Particle Beams, 2008, 20.
Citation:
zhang chun-lai, zu xiao-tao, jiang xiao-dong, et al. SiO2 sol-gel films after ammonia and heat two-step treatments[J]. High Power Laser and Particle Beams, 2008, 20.
SiO2 thin films were deposited using tetraethoxylsilane as precursor, ammonia as catalyst on K9 glass by sol-gel method. These films were post-treated by ammonia and heat. The properties of the coatings were characterized by ellipsometer, UV-vis spectrophotometry, FTIR-spectroscopy, scanning probe microscope and contact angle measurement apparatus. The results indicate that the thickness of the films with ammonia and heat treatment tend to decrease. Both the refractive index and water contact angle increase after ammonia treatment. However, they both decrease after heat treatment. The former increases by 0.236 for the first step, then decreases by 0.202 for the second. The latter increases to 58.92°, then decreases to 38.07°. The transmittance of the coatings turn to be better and contin