zhang chun-lai, jiang xiao-dong, yuan xiao-dong, et al. Effect of inter-layer heat treatment on two-layer SiO2/ZrO2 films[J]. High Power Laser and Particle Beams, 2008, 20.
Citation:
zhang chun-lai, jiang xiao-dong, yuan xiao-dong, et al. Effect of inter-layer heat treatment on two-layer SiO2/ZrO2 films[J]. High Power Laser and Particle Beams, 2008, 20.
zhang chun-lai, jiang xiao-dong, yuan xiao-dong, et al. Effect of inter-layer heat treatment on two-layer SiO2/ZrO2 films[J]. High Power Laser and Particle Beams, 2008, 20.
Citation:
zhang chun-lai, jiang xiao-dong, yuan xiao-dong, et al. Effect of inter-layer heat treatment on two-layer SiO2/ZrO2 films[J]. High Power Laser and Particle Beams, 2008, 20.
Two-layer SiO2/ZrO2 thin films were deposited on K9 glass by Sol-Gel dip-coating method. The colloidal suspension of ZrO2 and SiO2 were prepared using Zr(OPr)4 and TEOS as precursors, respectively. For sample 1, the ZrO2 film was directly deposited on the pre-deposited SiO2 film. For sample 2, the ZrO2 film was deposited on the pre-deposited and heat-treated SiO2 film. Atomic force microscopy(AFM), ellipometry and UV-VIS spectroscopy were used to characterize the thin films. The samples were simulated with three-layer Cauchy theoretical model. The simulated ellipsometric parameters curves were perfectly consistent with the experimental ones. The results showed that the thickness of infiltrated layer of sample 2 was reduced by 23 nm by using heat treatment compared with that of sample 1. As