Edge effects on material removal amount in ultra precise polishing process

yang wei; guo yin-biao; xu qiao; li ya-guo

Volume 20 Issue 10

Oct. 2008

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Abstract

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Article Navigation > High Power Laser and Particle Beams > 2008 > 20(10): 0-

xue chunrong, yi kui, wei chaoyang, et al. Optical properties of vacuum ultraviolet and deep ultraviolet region substrate materials[J]. High Power Laser and Particle Beams, 2009, 21.

Citation:

yang wei, guo yin-biao, xu qiao, et al. Edge effects on material removal amount in ultra precise polishing process[J]. High Power Laser and Particle Beams, 2008, 20.

xue chunrong, yi kui, wei chaoyang, et al. Optical properties of vacuum ultraviolet and deep ultraviolet region substrate materials[J]. High Power Laser and Particle Beams, 2009, 21.

Citation:

yang wei, guo yin-biao, xu qiao, et al. Edge effects on material removal amount in ultra precise polishing process[J]. High Power Laser and Particle Beams, 2008, 20.

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Edge effects on material removal amount in ultra precise polishing process

1.
Department of Mechanical and Electronical Engineering,Xiamen University,Xiamen 361005,China;
2.
Chengdu Fine Optical Engineering Research Centre,Chengdu 610041,China

Publish Date: 2008-10-15

Abstract

Abstract

The edge effects would happen when a workpiece extends beyond a polishing tool, which could lead to low polishing efficiency. So a new skin model, representing the nonlinear pressure distribution, was proposed to avoid the negative pressure and to calculate the amount of removed materials for the case of a circular tool that polishes a circular workpiece. A material removal amount model was established considering workpiece radius, workpiece-tool center distance and speed ratio. Its simulations show that good surface figures could be achieved by choosing proper values for the latter two parameters based on that model.
- ultra precise polishing,
- edge effects,
- skin model,
- pressure distribution,
- removed quantity

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