Secondary electron emission characteristic of nano-crystalline diamond films

li kai; jin xiao; gan kong-yin; wang han-bin; hu he-ping

Volume 20 Issue 10

Oct. 2008

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li kai, jin xiao, gan kong-yin, et al. Secondary electron emission characteristic of nano-crystalline diamond films[J]. High Power Laser and Particle Beams, 2008, 20.

Citation:

li kai, jin xiao, gan kong-yin, et al. Secondary electron emission characteristic of nano-crystalline diamond films[J]. High Power Laser and Particle Beams, 2008, 20.

li kai, jin xiao, gan kong-yin, et al. Secondary electron emission characteristic of nano-crystalline diamond films[J]. High Power Laser and Particle Beams, 2008, 20.

Citation:

li kai, jin xiao, gan kong-yin, et al. Secondary electron emission characteristic of nano-crystalline diamond films[J]. High Power Laser and Particle Beams, 2008, 20.

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Secondary electron emission characteristic of nano-crystalline diamond films

1.
Institute of Applied Electronics,CAEP,P.O.Box 919-1014,Mianyang 621900,China

Publish Date: 2008-10-15

Abstract

Abstract

The preparation,characterization and application of nanocrystalline diamond films have become a new “hot point” in the development of diamond films prepared by chemical vapor deposition. The preparation process of nanocrystalline diamond films with MPCVD method was introduced, as well as the result of surfaces analysis.Then an experiment device is designed to measure the Secondary electron emission coefficient(ＳＥＥＣ) in reflection mode.An expectable aim(ＳＥＥＣ is 15) has been achieved．
- high average power fel,
- nano-diamond films,
- mpcvd,
- secondary electron emission coefficient