tu yuchun, song zhuqing, huang qiushi, et al. Fabrication of laterally graded periodic Mo/Si multilayer using magnetron sputtering technology[J]. High Power Laser and Particle Beams, 2011, 23.
Citation:
tu yuchun, song zhuqing, huang qiushi, et al. Fabrication of laterally graded periodic Mo/Si multilayer using magnetron sputtering technology[J]. High Power Laser and Particle Beams, 2011, 23.
tu yuchun, song zhuqing, huang qiushi, et al. Fabrication of laterally graded periodic Mo/Si multilayer using magnetron sputtering technology[J]. High Power Laser and Particle Beams, 2011, 23.
Citation:
tu yuchun, song zhuqing, huang qiushi, et al. Fabrication of laterally graded periodic Mo/Si multilayer using magnetron sputtering technology[J]. High Power Laser and Particle Beams, 2011, 23.
A laterally graded multilayer was deposited on silicon substrate by using magnetron sputtering. The d-spacing gradient of 0.03 nm/mm was achieved across a 65 mm long range on the substrate’s surface, with d-spacing varying linearly from 8.41 nm to 6.57 nm, which was measured by grazing incidence X-ray reflection (GIXR). Extreme ultraviolet reflectivity was measured in National Synchrotron Radiation Laboratory(NSRL). The measured reflectivity is 60%~65% at the wavelength range of 13.3 to 15.9 nm.
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