pan lei, wang xiaoqiang, zhang zhong, et al. Fabrication of high uniformity Mo/Si multilayer with 120 mm diameter using magnetron sputtering[J]. High Power Laser and Particle Beams, 2010, 22.
Citation:
pan lei, wang xiaoqiang, zhang zhong, et al. Fabrication of high uniformity Mo/Si multilayer with 120 mm diameter using magnetron sputtering[J]. High Power Laser and Particle Beams, 2010, 22.
pan lei, wang xiaoqiang, zhang zhong, et al. Fabrication of high uniformity Mo/Si multilayer with 120 mm diameter using magnetron sputtering[J]. High Power Laser and Particle Beams, 2010, 22.
Citation:
pan lei, wang xiaoqiang, zhang zhong, et al. Fabrication of high uniformity Mo/Si multilayer with 120 mm diameter using magnetron sputtering[J]. High Power Laser and Particle Beams, 2010, 22.
Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Institute of Precision Optical Engineering,Department of Physics,Tongji University,Shanghai 200092,China;
2.
Experimental Physics and Computational Mathematics Laboratory,China Academy of Launch Vehicle Technology,Beijing 100076,China
In order to prepare large size multilayer mirrors for extreme ultraviolet, soft X-ray and X-ray applications, the Mo/Si multilayer was deposited on flat substrate in diameter of 120 mm with the substrate scanning over rectangular targets. By adjusting the speed of substrate scanning over sputtering targets, the depositing rate can be controlled, and the uniformity of layer thickness is improved significantly. After deposition, period thicknesses of multilayer on different positions of the mirror were measured by an X-ray diffractometer. The measured results show that, within the diameter of 120 mm, the uniformity of period thickness is within 0.26%. The reflectivities on different positions of the multilayer mirror were measured at the National Synchrotron Radiation Laboratory. The results
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