Development of optical shutter system in Hefei Light Source

wang jigang; sun baogen; lu ping; wang baoyun; wang xiaohui; gu liming; tang leilei

Volume 23 Issue 01

Sep. 2012

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Abstract

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Article Navigation > High Power Laser and Particle Beams > 2011 > 23(01): 0-

cheng bing-xun, wu wei-dong, he zhi-bing, et al. Effects of sputtering power on structure and properties of Ti films deposited by DC magnetron sputtering[J]. High Power Laser and Particle Beams, 2006, 18.

Citation:

wang jigang, sun baogen, lu ping, et al. Development of optical shutter system in Hefei Light Source[J]. High Power Laser and Particle Beams, 2011, 23.

Citation:

wang jigang, sun baogen, lu ping, et al. Development of optical shutter system in Hefei Light Source[J]. High Power Laser and Particle Beams, 2011, 23.

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Development of optical shutter system in Hefei Light Source

1.
National Synchrotron Radiation Laboratory,School of Nuclear Science and Technology,University of Science and Technology of China,P.O.Box 6022,Hefei 230029,China

Publish Date: 2010-12-27

Abstract

Abstract

The filling pattern is multi-bunch in Hefei Light Source (HLS). The optical shutter can pick single bunch from multi-bunch for streak camera system to measure, and thus largely reduces the power of input light and protects the vulnerable photocathode of streak camera effectively. The principle of the optical shutter system is presented, and a system is designed according to the wavelength and repetition frequency of light pulse, and the dimension and length of bunches in HLS. The characteristics of electro-optic modulator (EOM), high voltage driver and high speed synchronous divider are presented. The alignment and debugging of the system are introduced, and the measurements using oscilloscope and streak camera are presented.
- synchronous light,
- optical shutter,
- electro-optic modulator,
- high voltage driver,
- streak camera

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