Fabrication of broadband antireflection coating based on ion beam sputtering deposition technique with time-power monitoring

liu huasong; wang zhanshan; ji yiqin; shen zhengxiang; ma bin; cheng xinbin; jiao hongfei; chen deying; liu dandan; song hongjun

Volume 23 Issue 02

Sep. 2012

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Article Navigation > High Power Laser and Particle Beams > 2011 > 23(02): 0-

niu hong-chang, qian bao-liang. Particle simulation of compact L-band coaxial relativistic backward wave oscillator[J]. High Power Laser and Particle Beams, 2006, 18.

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liu huasong, wang zhanshan, ji yiqin, et al. Fabrication of broadband antireflection coating based on ion beam sputtering deposition technique with time-power monitoring[J]. High Power Laser and Particle Beams, 2011, 23.

niu hong-chang, qian bao-liang. Particle simulation of compact L-band coaxial relativistic backward wave oscillator[J]. High Power Laser and Particle Beams, 2006, 18.

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Fabrication of broadband antireflection coating based on ion beam sputtering deposition technique with time-power monitoring

1.
Institute of Precision Optical Engineering,Tongji University,Shanghai 200092,China;
2.
Institute of Opto-electronics,Harbin Institute of Technology,Harbin 150001,China;
3.
Tianjin Key Laboratory of Optical Thin Films,Tianjin Jinhang Institute of Technical Physics,Tianjin 300192,China

Publish Date: 2011-01-25

Abstract

Abstract

With the development of optical systems for multi-wavelength and wide-angle range, there is a requirement of the antireflection coating with wide-spectrum and wide-incidence angle range. In this paper, the substrate is super-smooth ZF6 (rms less than 0.6 nm) glass and HfO2 and SiO2 are selected as high index and low index materials, respectively. The broadband antireflection coating is designed, for wavelength form 600 to 1 200 nm and incidence angle of 0° to 30°. The influences of refractive index inhomogeneity, error of refractive index and error of layer physical thickness on its transmittance are analyzed. Ion beam sputtering deposition of time-power thickness monitoring is used to manufacture the antireflection coating and the each layer thickness systematic co
- broadband antireflection coating,
- ion beam sputtering deposition,
- time-power monitoring,
- correction of layer thickness

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