Third harmonic separator with high laser-induced damage threshold

wang xiaodong; zhang jinlong; ma bin; jiao hongfei; ding tao; cheng xinbi

Volume 23 Issue 07

Sep. 2012

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wang xiaodong, zhang jinlong, ma bin, et al. Third harmonic separator with high laser-induced damage threshold[J]. High Power Laser and Particle Beams, 2011, 23.

Citation:

wang xiaodong, zhang jinlong, ma bin, et al. Third harmonic separator with high laser-induced damage threshold[J]. High Power Laser and Particle Beams, 2011, 23.

wang xiaodong, zhang jinlong, ma bin, et al. Third harmonic separator with high laser-induced damage threshold[J]. High Power Laser and Particle Beams, 2011, 23.

Citation:

wang xiaodong, zhang jinlong, ma bin, et al. Third harmonic separator with high laser-induced damage threshold[J]. High Power Laser and Particle Beams, 2011, 23.

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Third harmonic separator with high laser-induced damage threshold

1.
Institute of Precision Optical Engineering,Tongji University,Shanghai 200092,China;
2.
Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Shanghai 200092,China;
3.
School of Aerospace Engineering and Applied Mechanics,Tongji University,Shanghai 200092,China

Publish Date: 2011-07-21

Abstract

Abstract

Using electron beam evaporation, a 355 nm separator was designed by depositiing SiO2 and HfO2 alternatively. The coating has a reflectivity of larger than 99% at 355 nm through optimization and a transmittance larger than 99% at 532 nm and 1 064 nm. It has good electric-field distribution. The spectra of the fabricated coating is close to the designed one. The laser-induced damage threshold of the coating is 5.1 J/cm2. Morphology of laser-induced damage of the coating was characterized by differential interference contrast microscope．
- third harmonic separator,
- electron beam evaporation,
- laser-induced damaged threshold,
- thin film