dong lei, zhao yuan-an, yi kui, et al. Influence of different kinds of evaporation sources on films uniformity[J]. High Power Laser and Particle Beams, 2005, 17.
Citation:
dong lei, zhao yuan-an, yi kui, et al. Influence of different kinds of evaporation sources on films uniformity[J]. High Power Laser and Particle Beams, 2005, 17.
dong lei, zhao yuan-an, yi kui, et al. Influence of different kinds of evaporation sources on films uniformity[J]. High Power Laser and Particle Beams, 2005, 17.
Citation:
dong lei, zhao yuan-an, yi kui, et al. Influence of different kinds of evaporation sources on films uniformity[J]. High Power Laser and Particle Beams, 2005, 17.
Several evaporation sources, including the plane and spherical source, and their influence on film uniformity were studied. It is found that when the ratio between the radius of the source surface and the height of the substrate is less than 1/17, the area of the source surfaces can be ignored, and when it is greater than 1/10, the area of the source surface should be considered. When the ratio between the depth of the spherical surface and the radius of the source surface is less than 0.5, the spherical source has little effect on films uniformity compared with the plane source, and when it is greater than 0.6, the influence of spherical surface source on films uniformity should be considered. Based on the study, the relation between the emission characteristic of sources and film uniform
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