Characteristics of lanthanum hexaboride thin film cathode deposited on large area substrate

liu zengyi; lin zulun; wang xiaoju; cao guichuan; qi kangcheng

Volume 23 Issue 04

Apr. 2011

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Article Navigation > High Power Laser and Particle Beams > 2011 > 23(04): 0-

ding yaogen, shen bin, ding haibing. Influence of load mismatch on output characteristics of klystron[J]. High Power Laser and Particle Beams, 2011, 23.

Citation:

liu zengyi, lin zulun, wang xiaoju, et al. Characteristics of lanthanum hexaboride thin film cathode deposited on large area substrate[J]. High Power Laser and Particle Beams, 2011, 23.

ding yaogen, shen bin, ding haibing. Influence of load mismatch on output characteristics of klystron[J]. High Power Laser and Particle Beams, 2011, 23.

Citation:

liu zengyi, lin zulun, wang xiaoju, et al. Characteristics of lanthanum hexaboride thin film cathode deposited on large area substrate[J]. High Power Laser and Particle Beams, 2011, 23.

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Characteristics of lanthanum hexaboride thin film cathode deposited on large area substrate

1.
School of Opto-Electronic Information,University of Electronic Science and Technology of China,Chengdu 610054,China

Publish Date: 2011-04-14

Abstract

Abstract

The lanthanum hexaboride (LaB6) thin film cathode was deposited on large-area glass substrate and Ta substrate by the method of electron-beam deposition under the substrate temperature of 250 ℃ and the vacuum of 2×10-4 Pa. The deposited LaB6 thin films are predominantly (100)-oriented. The lattice displacement between LaB6 film and the LaB6 bulk target is minimal and the crystal size is relatively small at 45° deposition. Theoretically, the LaB6 film deposited at 45° has the possibility of forming low stress contact on different substrates. The work function of the LaB6 film cathode was measured to be 2.56 eV, which also proves the (100)-oriented growth of LaB6 films.
- electron-beam deposition,
- lab6 film,
- deposition angle,
- work function,
- large area film cathode

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