liu feng, zhang weili, jin yunxia. Effect of ion beam technique on properties of hafnium dioxide thin film[J]. High Power Laser and Particle Beams, 2011, 23.
Citation:
liu feng, zhang weili, jin yunxia. Effect of ion beam technique on properties of hafnium dioxide thin film[J]. High Power Laser and Particle Beams, 2011, 23.
liu feng, zhang weili, jin yunxia. Effect of ion beam technique on properties of hafnium dioxide thin film[J]. High Power Laser and Particle Beams, 2011, 23.
Citation:
liu feng, zhang weili, jin yunxia. Effect of ion beam technique on properties of hafnium dioxide thin film[J]. High Power Laser and Particle Beams, 2011, 23.
Key Laboratory of Material Science and Technology for High Power Laser,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;
2.
Graduate University of Chinese Academy of Sciences,Beijing 100039,China
The hafnium dioxide thin films were prepared by using ion beam in substrate clean, deposition and posttreatment of films. The optical performance, surface characteristics and laser damage of the films were tested and analyzed. Experiment results show that the application of ion beam deposition in clean of substrates can wipe off polishing powder particle, enhance surface adsorption and increase stacking density. The application of ion beam deposition in deposition of thin films can improve thin films structure, decrease absorption of moisture, and increase damage threshold. The application of ion beam deposition in post-treatment can reduce surface roughness and improve damage threshold．
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