huang qiushi, li haochuan, zhu jingtao, et al. Stress analysis of W, WSi2, Si single layers and W/Si, WSi2/Si ultilayers fabricated by magnetron sputtering[J]. High Power Laser and Particle Beams, 2011, 23.
Citation:
huang qiushi, li haochuan, zhu jingtao, et al. Stress analysis of W, WSi2, Si single layers and W/Si, WSi2/Si ultilayers fabricated by magnetron sputtering[J]. High Power Laser and Particle Beams, 2011, 23.
huang qiushi, li haochuan, zhu jingtao, et al. Stress analysis of W, WSi2, Si single layers and W/Si, WSi2/Si ultilayers fabricated by magnetron sputtering[J]. High Power Laser and Particle Beams, 2011, 23.
Citation:
huang qiushi, li haochuan, zhu jingtao, et al. Stress analysis of W, WSi2, Si single layers and W/Si, WSi2/Si ultilayers fabricated by magnetron sputtering[J]. High Power Laser and Particle Beams, 2011, 23.
Institute of Precision Optical Engineering,Department of Physics,Tongji University,Shanghai 200092,China;.Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Tongji University,Shanghai 200092,China;.Research Center of Laser Fusion,CAEP,P.O.Box 919-987,Mianyang 621900,China
A series of W, WSi2, Si thin films and W/Si, WSi2/Si periodic multilayers were fabricated by using DC magnetron sputtering technology. Surface profiles before and after deposition were measured with a stylus profiler and the stresses were calculated. The results indicate that W thin films show relatively large compressive stress, while W/Si multilayers show tensile stress. Both WSi2 thin films and WSi2/Si periodic multilayers show compressive stress. WSi2/Si periodic multilayers have the most stable stress state with no sharp change, and is a good material combination for X-ray multilayer optics with a large number of bilayers.
DownLoad: