li shuang, wang jianguo. Improvement of field uniformity by stirring source in reverberation chamber[J]. High Power Laser and Particle Beams, 2011, 23.
Citation:
li shuang, wang jianguo. Improvement of field uniformity by stirring source in reverberation chamber[J]. High Power Laser and Particle Beams, 2011, 23.
li shuang, wang jianguo. Improvement of field uniformity by stirring source in reverberation chamber[J]. High Power Laser and Particle Beams, 2011, 23.
Citation:
li shuang, wang jianguo. Improvement of field uniformity by stirring source in reverberation chamber[J]. High Power Laser and Particle Beams, 2011, 23.
This article mainly studies the influence of source stirring on the field characteristics, especially the field uniformity, in the reverberation chamber under short pulse excitation. Firstly, the factors that may affect the field distribution are summarized. Then the focus is on the effects of moving the sources consecutively on the electromagnetic field distributions, including the maximum and the standard deviation of electric field strength. The results show that the maximum of electric field strength can reach as high as 6.7 kV/m and the standard deviation of the field distribution falls below 3 dB after stirring the sources. Therefore, the method of source stirring can improve the field uniformity effectively and it is useful in the construction of homogenous electromagnetic field env
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