Ｔhin film weak absorption of 3.8μm and 2.8μm laser measured by surface thermal lensing technique

jiang teng-jiao; huang wei; qi wen-zong; ling xiu-lan; yang fu; zhang bin; cai bang wei

Volume 16 Issue 12

Dec. 2004

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Article Navigation > High Power Laser and Particle Beams > 2004 > 16(12): 0-

xu hong-liang, wang lin, li yong-jun, et al. Study of RF system of Hefei Ｓtorage Ｒing under injection[J]. High Power Laser and Particle Beams, 2004, 16.

Citation:

jiang teng-jiao, huang wei, qi wen-zong, et al. Ｔhin film weak absorption of 3.8μm and 2.8μm laser measured by surface thermal lensing technique[J]. High Power Laser and Particle Beams, 2004, 16.

xu hong-liang, wang lin, li yong-jun, et al. Study of RF system of Hefei Ｓtorage Ｒing under injection[J]. High Power Laser and Particle Beams, 2004, 16.

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Ｔhin film weak absorption of 3.8μm and 2.8μm laser measured by surface thermal lensing technique

1.
College of Electronic Information,Sichuan University,Chengdu 610064,China;
2.
Institute of Optics and Electronics,the Chinese Academy of Sciences,P.O.Box 350,Shuangliu 610209,China;
3.
Department of Physics,Hebei North College,Zhangjiakou 075028,China

Publish Date: 2004-12-15

Abstract

Abstract

Ｕsing the surface thermal lensing technique, weak absorption of different optical thin films, including the single-layer ZnS and YbF3 dielectric thin films with different thickness, as well as the different multilayer thin films YbF3/ZnS deposited on Si, and multilayer antireflectivity thin films YbF3/ZnS deposited on CaF2 window has been measured. The experimental results of films irradiated by 3.8μm and 2.8μm lasers have been compared and analyzed. The experimental results show that absorption at 2.8μm, is much greater than the one at 3.8μm,and the difference between them is one order of magnitude. The lowest absorption at 3.8μm is 4.57×10－4, and the system sensitivity is 10－５ level．
- surface thermal lensing technique,
- 3.8μm laser,
- 2.8μm laser,
- weak absorption,
- optical thin films

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