Wei Yuan, Xie Honggang, Gong Ding, et al. Numerical simulation of long-term radiation effects for MOSFETs[J]. High Power Laser and Particle Beams, 2013, 25: 1031-1034.
Citation:
Wei Yuan, Xie Honggang, Gong Ding, et al. Numerical simulation of long-term radiation effects for MOSFETs[J]. High Power Laser and Particle Beams, 2013, 25: 1031-1034.
Wei Yuan, Xie Honggang, Gong Ding, et al. Numerical simulation of long-term radiation effects for MOSFETs[J]. High Power Laser and Particle Beams, 2013, 25: 1031-1034.
Citation:
Wei Yuan, Xie Honggang, Gong Ding, et al. Numerical simulation of long-term radiation effects for MOSFETs[J]. High Power Laser and Particle Beams, 2013, 25: 1031-1034.
A coupled algorithm is introduced to simulate the long-term radiation effects of MOSFETs, which combines particle transport with semiconductor governing equations. The former is dealt with Monte-Carlo method, and the latter is solved by finite-volume method. The trapped charge in SiO2 and the free charge in Si are both described by the drift-diffusion model, and the deposited energy by incident particles can be coupled with the continuous equations of charge, acting as a source item. The discrete form of governing equations is obtained using the finite-volume method, and the numerical solutions of these equations are the long-term radiation response result of MOSFETs. The threshold voltage shift and off-state leakage current of an irradiated MOSFET are simulated with the coupled algorithm respectively, showing a good accordance with results by other calculations.