Characteristics of RF ion source electromagnetic field TANG Ping

ying; ding bo nan; dai jing yi

Volume 15 Issue 10

Oct. 2003

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Abstract

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zhou bin, qiu heng-shan, liu xiao-lin, et al. Single-step fabrication of diffraction grating on TiO2 photosensitive gels film by direct UV irradiation[J]. High Power Laser and Particle Beams, 2004, 16.

Citation:

ying, ding bo nan, dai jing yi, et al. Characteristics of RF ion source electromagnetic field TANG Ping[J]. High Power Laser and Particle Beams, 2003, 15.

Citation:

ying, ding bo nan, dai jing yi, et al. Characteristics of RF ion source electromagnetic field TANG Ping[J]. High Power Laser and Particle Beams, 2003, 15.

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Characteristics of RF ion source electromagnetic field TANG Ping

1.
Institute of Electronic Engineering,CAEP,P.O.Box 919 523,Mianyang 621900,China;
2.
China Academy of Engineering Physics,P.O.Box 919 1,Mianyang 621900,China

Publish Date: 2003-10-15

Abstract

Abstract

Distribution of electromagnetic field in the space of Htype RF ion source is researched theoretically. Threedimensional vector graphs of electric field intensity and magnetic induction density in the space of RF ion source are calculated and plotted by Mafia software. The conclusion that axial electric field intensity is more important during the breakdown of RF ion source is made out by comparing it and azimuthal electric field intensity before breakdown, and then, the breakdown criterion of RF ion source is calculated, which is reasonably in agreement with experimental data.
- rf ion source,
- criterion of breakdown,
- field distribution,

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