shen lin, xiong sheng-ming, liu hong-xiang, et al. Technology of the high laser reflectivity oxide coatings deposition by ion-beam sputtering[J]. High Power Laser and Particle Beams, 2003, 15.
Citation:
shen lin, xiong sheng-ming, liu hong-xiang, et al. Technology of the high laser reflectivity oxide coatings deposition by ion-beam sputtering[J]. High Power Laser and Particle Beams, 2003, 15.
shen lin, xiong sheng-ming, liu hong-xiang, et al. Technology of the high laser reflectivity oxide coatings deposition by ion-beam sputtering[J]. High Power Laser and Particle Beams, 2003, 15.
Citation:
shen lin, xiong sheng-ming, liu hong-xiang, et al. Technology of the high laser reflectivity oxide coatings deposition by ion-beam sputtering[J]. High Power Laser and Particle Beams, 2003, 15.
The oxide laser reflecting multi-layers of Ta2O5 and SiO2 were prepared by double ion-beams sputtering method. The deposition techniques, the uniformity of layer thickness, and the optical charactes were studied. A uniform distribution is achieved by means of changing the tilt degree of substrate and the oscillating degree of the target. In addition, the refractive index, the structure of the layers, center wavelength of 633nm and 1 315nm baffleboard, AR coatings and times control method were presented and discussed.
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