liu qiang, lin li bin, gan rong bing, et al. Experiment study on the uniformity of damage threshold of oxide films[J]. High Power Laser and Particle Beams, 2003, 15.
Citation:
liu qiang, lin li bin, gan rong bing, et al. Experiment study on the uniformity of damage threshold of oxide films[J]. High Power Laser and Particle Beams, 2003, 15.
liu qiang, lin li bin, gan rong bing, et al. Experiment study on the uniformity of damage threshold of oxide films[J]. High Power Laser and Particle Beams, 2003, 15.
Citation:
liu qiang, lin li bin, gan rong bing, et al. Experiment study on the uniformity of damage threshold of oxide films[J]. High Power Laser and Particle Beams, 2003, 15.
Using a new cleaning technology, K9 glass substrates were cleaned, and some singlelayer films were prepared with various oxide materials on the surface of the substrates using the electron beam evaporation technique. The laser induced damage thresholds of the film were got by using Ron1 test and the experiment repeatability is good. The experiment results show that the placement duration of the substrate after cleaning should influence the homogeneity of the damage threshold of the films, but do not influence the damage thresholds itself. To improve the homogeneity of the film thresholds, films are, as soon as possible, deposited after cleaning. Threshold uniformity is also influenced by laser parameters.
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