轴对称真空二极管空间电荷限制流

郝建红; 曹占国; 周前红

doi:10.11884/HPLPB201830.180201

轴对称真空二极管空间电荷限制流

doi: 10.11884/HPLPB201830.180201

1.
华北电力大学电气与电子工程学院, 北京 102206
2.
北京应用物理与计算数学研究所, 北京 100094

基金项目:

国家自然科学基金项目 61372050

详细信息

作者简介:
郝建红(1960—), 女，教授，博士生导师，从事电磁场与微波技术的研究; jianhonghao@ncepu.edu.cn

通讯作者:
曹占国(1993—), 男，硕士，从事真空弧放电的研究; 1711470531@qq.com

中图分类号: TN132
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出版历程
- 收稿日期: 2018-07-24
- 修回日期: 2018-10-10
- 刊出日期: 2018-12-15

Space charge limited current of axisymmetric vacuum diode

1.
School of Electrical and Electronic Engineering, North China Electric Power University, Beijing 102206, China
2.
Beijing Institute of Applied Physics and Computational Mathematics, Beijing 100094, China

摘要

摘要: 基于ArcPIC代码采用PIC-MCC方法，模拟研究了轴对称真空二极管放电时电子密度和阴极表面场强分布情况，同时给出了二维空间电荷限制流的一阶和二阶拟合公式。研究发现，真空二极管放电时阴极表面电场会随阴极注入电流密度的增加而增加，而后出现振荡并趋于一个稳定状态；二维空间电荷限制流密度值随阴极发射半径的增大而减小，且阴极发射半径越大越接近一维空间电荷限制流值。
- 真空二极管 /
- 空间电荷限制流 /
- PIC-MCC模拟
Abstract: Based on the ArcPIC code, this paper analyzes the distribution of electron density and the field on the cathode surface using the PIC-MCC method. At the same time, it gives the fitting formula of two-dimensional space charge limited current. This provides a theoretical reference for the design and application of vacuum diodes. It is found that the electric field of cathode surface increases with the increase of cathode current density, then oscillates and tends to a stable state. The two-dimensional space charge limited current density decreases with the increase of cathode emission radius, and the larger the cathode emission radius, the closer the current to the one-dimensional space charge limited current.
- vacuum diode /
- space charge limited current /
- PIC-MCC simulation

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图 1 二极管计算模型

Figure 1. Calculation models of diode

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图 2 计算模型参数设置

Figure 2. Parameters of calculation model

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图 3 不同时刻二维电子密度分布

Figure 3. Distribution of two-dimensional electron density at different time

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图 4 阴极表面场强随时间分布

Figure 4. Distribution of field intensity with time on the surface of cathode

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图 5 阴阳极电流密度与阴极注入电流密度的关系

Figure 5. Relationship between pole current density and cathode injection current density

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图 6 二维空间电荷限制流密度与阴极发射半径的关系曲线

Figure 6. Relationship between two-dimensional space charge limited current and cathode emission radius

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图 7 二维与一维空间电荷限制流密度的比值与形状因子的关系曲线

Figure 7. Relationship between ratio of two-dimensional and one-dimensional space charge limited current with shape factor

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表 1 不同发射半径下的二维空间电荷限制流

Table 1. Two-dimensional space charge limited current under different emission radius

r/dz	r/D	j_CL(2)/(10⁹ A·m²)	j_CL(2)/j_CL(1)
20	0.4	33.454 8	2.182 2
40	0.8	22.869 8	1.491 8
60	1.2	20.831 2	1.358 8
80	1.6	19.281 9	1.257 7
100	2	18.241 7	1.189 9
120	2.4	18.019 5	1.175 4
140	2.8	17.708 7	1.155 1
160	3.2	17.677 1	1.153 1

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