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45°高反膜中节瘤缺陷的电场增强效应及损伤特性

潘顺民 卫耀伟 安晨辉 罗振飞 王健

潘顺民, 卫耀伟, 安晨辉, 等. 45°高反膜中节瘤缺陷的电场增强效应及损伤特性[J]. 强激光与粒子束, 2020, 32: 071006. doi: 10.11884/HPLPB202032.200028
引用本文: 潘顺民, 卫耀伟, 安晨辉, 等. 45°高反膜中节瘤缺陷的电场增强效应及损伤特性[J]. 强激光与粒子束, 2020, 32: 071006. doi: 10.11884/HPLPB202032.200028
Pan Shunmin, Wei Yaowei, An Chenhui, et al. Electric field enhancement effect and damage characteristics of nodular defect in 45° high-reflection coating[J]. High Power Laser and Particle Beams, 2020, 32: 071006. doi: 10.11884/HPLPB202032.200028
Citation: Pan Shunmin, Wei Yaowei, An Chenhui, et al. Electric field enhancement effect and damage characteristics of nodular defect in 45° high-reflection coating[J]. High Power Laser and Particle Beams, 2020, 32: 071006. doi: 10.11884/HPLPB202032.200028

45°高反膜中节瘤缺陷的电场增强效应及损伤特性

doi: 10.11884/HPLPB202032.200028
基金项目: 国家自然科学基金项目(11974320)
详细信息
    作者简介:

    潘顺民(1990—),男,硕士,从事高功率激光薄膜元件阈值研究;1510359221@qq.com

    通讯作者:

    卫耀伟(1983—),男,副研究员,从事高功率激光薄膜研制;jimmy1363797@aliyun.com

  • 中图分类号: TN244

Electric field enhancement effect and damage characteristics of nodular defect in 45° high-reflection coating

  • 摘要: 研究设计和制备了中心波长为1 064 nm的45°多层膜反射镜,通过数值仿真结合实验,对薄膜中节瘤缺陷引起的电场增强效应及其对薄膜抗激光损伤性能的影响进行了研究。结果表明:当1 064 nm激光从右至左45°斜入射时,电场增强效应主要出现在节瘤缺陷的表层及其左侧轮廓中部,电场增强效应随节瘤缺陷尺寸增大而增强。实验上,在清洁的基板表面喷布单分散SiO2微球作为人工节瘤种子,采用电子束蒸发制备法完成多层全反膜的制备,采用R-on-1方式对薄膜样品进行激光损伤测试。结果表明,薄膜的损伤阈值随着节瘤缺陷尺寸增加而减小。通过综合分析电场增强效应、薄膜损伤测试结果及损伤形貌特征得出,薄膜损伤阈值降低是由于节瘤缺陷和薄膜中微缺陷共同作用的结果。
  • 图  1  45°高反膜电场强度分布

    Figure  1.  Electric field intensity (EFI) distribution of 45° HR coating

    图  2  不同直径节瘤缺陷的s光和p光电场增强效应

    Figure  2.  Electric field enhancement effects of nodules with different diameters under s and p polarized light irradiation

    图  3  人工节瘤形貌(种子尺寸:2 μm)

    Figure  3.  Morphology of artificial nodule(seed diameter: 2 μm)

    图  4  样品的最小和最大激光损伤能量

    Figure  4.  The minimum and maximum laser damage energies of samples

    图  5  损伤斑形貌

    Figure  5.  Morphologyies of coating damage spots

    图  6  样品C损伤形貌

    Figure  6.  Damage morphology of sample C

    图  7  微缺陷喷溅损伤斑

    Figure  7.  Damage spot produced by micro defect ejection

    图  8  节瘤喷溅坑的表面和截面形貌图

    Figure  8.  Surface morphology and cross-section images of nodule pits

    表  1  不同区域的电场强度

    Table  1.   The electric field intensity in different regions

    seed diameter/μmelectric field intensity
    s-polarizedp-polarized
    region 1region 2region 3region 1region 2region 3
    0.5 3.78 4.59 6.37 5.14 3.06 4.06
    1 5.99 6.75 5.65 9.14 8.01 5.63
    2 10.43 10.69 7.38 23.55 16.07 5.00
    下载: 导出CSV

    表  2  样品参数

    Table  2.   Sample parameters

    sample numberseed diameter d/μmnodule diameter D/μmcoating thickness t/μmcoefficient c
    A0.53.5±0.2~6.753.62
    B14.8±0.23.41
    C27.0±0.23.63
    下载: 导出CSV
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出版历程
  • 收稿日期:  2020-02-02
  • 修回日期:  2020-04-14
  • 刊出日期:  2020-06-24

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